Monoacid

A specialized organic acid solution used for oxide removal and surface preparation in electronic and semiconductor manufacturing processes.

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Item Name Molecule/ Chemical Formula
H2SO4 Sulfuric Acid H2SO4
HAC Acetic Acid CH3COOH
HCI Hydrochloric Acid HCI
HF Hydrofluoric Acid HF
HNO3 Nitric Acid HNO3

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Hydrogen Peroxide

Hydrogen Peroxide

Hydrogen Peroxide (H2O2) plays a crucial role in semiconductor manufacturing processes. It is commonly used in wet chemical cleaning processes to help remove organic contaminants and metal residues from wafer surfaces.
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Fixer

Fixer

Fixer is a chemical solution designed to fix images and ensure their long-term preservation.
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Developer Cleaners

Developer Cleaners

Developer cleaners are used in semiconductor processes to clean and preserve the cleanliness of development tanks, ensuring process stability and precision.
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Ethanol

Ethanol

Ethanol is commonly used in semiconductor manufacturing processes. It serves as a cleaner and solvent for cleaning wafer surfaces and removing contaminants during production.
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Solvents

Solvents

High-efficiency electronic-grade solvents designed for flux removal, degreasing, and precision cleaning in SMT and semiconductor processes.
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